Introduction of products

Introduction of products Abrasive Cloth

Polishing Pad

Polishing Pad

Advantages

Supply products that meet customer’s needs
  • Diverse application of polishing pad is possible due to our capability of developing and producing PU resin that is necessary for polishing pad manufacturing.
  •  We design the physical properties and product structures of polishing pad to meet our customers' needs, and then supply to them.
Technology and Know-how
  • We possess excellent polishing technology acquired by manufacturing technology and an extensive R&D system.

Use

  • Silicon wafer, Glass Polishing, Metal Polishing
POLISHING PAD
product list
Use Name Type Characteristics
Silicon/
Sapphire wafer		 Notch
Polishing Pad		 MP-3340(4.0) NWF Type
  1. Application of grinding technology that does not cause scratches
  2. Polishing efficiency due to high PU density
MP-3340(4.5) NWF Type
MP-3330(4.5) NWF Type
Back
Polishing Pad		 MP-3030 NWF Type
  1. No burn out.
  2. Scratches do not occur
MP-3040 NWF Type
MP-4030 NWF Type
Edge
Polishing Pad		 MP-3040(2.4) NWF Type
  1. Excellent fluidity of slurry
  2. Good PU dispersibility and long life time
MP-3040(3.0) NWF Type
MP-3030 NWF Type
Stock Removal
Polishing Pad		 MP-4060 NWF Type
  1. Removal rate is high.
  2. Good PU dispersibility and long life time
MP-4060-7 NWF Type
MP-4311 NWF Type
Chuck
Back Pad		 MP-2730 PU Film Type
  1. Excellent pressure dispersion ability on wafer
  2. Excellent flatness
MP-2800 PU Film Type (Closed Cell)
MP-2520NB PU Film Type (Closed Cell)
Final
Polishing Pad		 MP-8084 PU Film/NWF Type
  1. Good slurry fluidity
  2. Scratches are less likely to occur
  3. High removal rate
MP-8030 PU Film/NWF Type
MP-8055 PU Film/NWF Type
Metal Metal
Polishing Pad		 MP-1278 PU Film Type (Opened Cell)
  1. Scratches do not occur
  2. High polishing rate and high polishing speed
  3. Optical cable can be polished
Tempered Glass Glass holding Back Pad MP-2027 PU Film Type (Closed Cell)
  1. Water absorption rate is less than 2%
  2. Strong adherence to glass
  3. Excellent compression recovery rate
  4. Excellent flatness of pad
MP-2027 PU Film Type (Closed Cell)
3D Glass Round Glass
Polishing Pad		 MP-7412NGM
MP-3060G		 PU Film Type (Opened Cell)
NWF Type
  1. Superior curved surface due to sponge cushion
  2. Improvement in polishing amount due to mixed arrangement of Film and NWF type
  3. High glass resolution