Polishing Pads
That Illuminate Your Work

Polishing Pad

Polishing Pad
Advantages
  • Our products are customized to suit the specific needs of the client.
  • In-house development and production of PU resins essential for pad manufacturing enables a wide range of pad applications.
  • The core properties and structural design of the pads are tailored to client-specific applications.
  • Based on our advanced technical expertise and know-how, we offer superior polishing performance through proprietary manufacturing and R&D systems.
Applications

Silicon wafer, Glass Polishing, Metal Polishing

Application Product Name Type Product Features
Silicon/
Sapphire Wafer
Notch
Polishing Pad
MP-3340(4.0) NWF Type
  1. Scratch-free grinding technology
  2. High polishing efficiency enabled by high-density PU
MP-3330(4.5) NWF Type
Back
Polishing Pad
MP-3030 NWF Type
  1. No burn-out during use
  2. No surface scratches during operation
MP-4030 NWF Type
Edge
Polishing Pad
MP-3040(2.4) NWF Type
  1. Excellent slurry flowability
  2. Superior PU dispersion for extended product life
Stock Removal
Polishing Pad
MP-4060 NWF Type
  1. High removal rate
  2. Superior PU dispersion for extended product life
MP-4311 NWF Type
Chuck
Back Pad
MP-2730 PU Film Type
  1. Excellent pressure distribution across the wafer surface
  2. Outstanding planarity
MP-2800 PU Film Type (Closed Cell)
Final
Polishing Pad
MP-8415 PU Film/NWF Type
  1. Excellent slurry flowability
  2. Low risk of scratches
  3. Superior removal performance
MP-8260 PU Film/NWF Type
MP-8272E PU Film/NWF Type
Metal Metal
Polishing Pad
MP-1278 PU Film Type (Opened Cell)
  1. Scratch-free processing
  2. High material removal volume and speed
  3. Suitable for optical fiber polishing
Tempered Glass Glass holding
Back Pad
MP-2027 PU Film Type (Closed Cell)
  1. Water absorption rate below 2%
  2. Excellent adhesion to glass
MP-2028 PU Film Type (Closed Cell)
3D Glass Round Glass
Polishing Pad
MP-7412NGM PU Film Type (Opened Cell)
  1. Sponge cushioning for superior adaptability to curved surfaces
  2. Improved removal through mixed arrangement of film and non-woven fabric (NWF)
MP-3033G NWF Type